Paper
1 July 2003 Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R)
Timothy D. Stanley, Richard J. Markle, Brad Van Eck, Brian K. Cusson, Matthew A. Purdy, K. J. Stanley
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Abstract
This paper takes published improvements in fabricator metrics that result from Advanced Process Control,and, applying an International SEMATECH cost model to the results, quantifies the expected economic impact. By converting the improvements in factory metrics to dollars, they can be compared. The benefits are given by equipment type, and by factory benefit mechanism. The majority of these calculations are based on Run-to-Run control.
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Timothy D. Stanley, Richard J. Markle, Brad Van Eck, Brian K. Cusson, Matthew A. Purdy, and K. J. Stanley "Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R)", Proc. SPIE 5044, Advanced Process Control and Automation, (1 July 2003); https://doi.org/10.1117/12.485316
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KEYWORDS
Semiconducting wafers

Chemical mechanical planarization

Process control

Manufacturing

Semiconductors

Semiconductor manufacturing

Diffusion

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