Quantum lithography

Samuel L. Braunstein; Agedi N. Boto; Pieter Kok; Daniel S. Abrams; Colin P. Williams; Jonathan P. Dowling

doi:10.1117/12.497420

16 May 2003 Quantum lithography

Samuel L. Braunstein, Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Colin P. Williams, Jonathan P. Dowling

Proceedings Volume 5111, Fluctuations and Noise in Photonics and Quantum Optics; (2003) https://doi.org/10.1117/12.497420
Event: SPIE's First International Symposium on Fluctuations and Noise, 2003, Santa Fe, New Mexico, United States

Abstract

We show how to beat the `fundamental' noise limits in optical lithography using entangled quantum states. In this talk we will give the theoretical background to optical lithography and its quantum formulation. A proof-in-principle experimental demonstration is described.

Citation Download Citation

Samuel L. Braunstein, Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Colin P. Williams, and Jonathan P. Dowling "Quantum lithography", Proc. SPIE 5111, Fluctuations and Noise in Photonics and Quantum Optics, (16 May 2003); https://doi.org/10.1117/12.497420

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