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29 April 2003 Development of microstructure in nanostructures and thin films
Max O Bloomfield, Yeon Ho Im, Jian Wang, Hanchen Huang, Timothy S. Cale
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Proceedings Volume 5118, Nanotechnology; (2003) https://doi.org/10.1117/12.499465
Event: Microtechnologies for the New Millennium 2003, 2003, Maspalomas, Gran Canaria, Canary Islands, Spain
Abstract
We have created a finite-element based, multiple-material, levelset-based code to implicitly represent and track evolving islands and grains. With this method, the code can track island growth in three dimensions through nucleation to coalescence into a grain structure. We discuss the numerical methods, capabilities, and limitations of the code, and then examine the microstructures that result from different models of growth based on starting structures derived from atomistic Monte Carlo simulations. We show simulation results from a kinetically limited process (electroless deposition), a transport-limited process (physical vapor deposition), and a process neither transport nor kinetically limited (physical vapor deposition with orientation dependent sticking factors).
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Max O Bloomfield, Yeon Ho Im, Jian Wang, Hanchen Huang, and Timothy S. Cale "Development of microstructure in nanostructures and thin films", Proc. SPIE 5118, Nanotechnology, (29 April 2003); https://doi.org/10.1117/12.499465
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KEYWORDS
Process modeling
Monte Carlo methods
Interfaces
Physical vapor deposition
Systems modeling
3D modeling
Particles
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