Early mask making during the 1960s in Dresden

Hans Willy Becker

doi:10.1117/12.515064

28 May 2003 Early mask making during the 1960s in Dresden

Hans Willy Becker

Proceedings Volume 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2003) https://doi.org/10.1117/12.515064
Event: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2003, Sonthofen, Germany

Abstract

One of the first European institutes for microelectronics, the Arbeitsstelle für Molekularelektronik Dresden AME, was founded in 1961 by WERNER HARTMANN. The purpose was to develop processes for fabrication of integrated circuits. Concerning microlithography at first a five-stage mask technique was used since 1965. The artwork original which was called 'Vorlage" was cut with a scale of about 200: 1 .Using a reduction camera the artwork original was reduced about 20 times, to get the reticle known as the "Zwischennegativ". This reticle was then further reduced about 10 times by "step and repeat", using a projection microscope, to get a master mask known as the "Originalschablone" whose scale was then 1 : 1 . By direct photocopying of the master mask one obtained a working mask which was called the "Arbeitsschablone" . Finally, an aligned direct exposure of the working mask on to a wafer created, layer by layer, the micro-pattern of the chip array. Concerning the materials a double layer film was used for the artwork originals, and 2 inch photographic plates were used for the reticles and masks. In this way the first East German bipolar integrated circuits, NOR gates with 8 transistors, were made in Dresden in 1967. This was done with 4 masking levels on 25 mm Si wafers with 1 .5 mmchip size and 20 ?m minimal figure width (critical dimensions). In the late 1960's some improvements were introduced, particularly the 6-barrel semi-automatic photorepeater, which improved the figure width and gave lower tolerances. The largest chip made in 1969 was a J-K master-slave flipflop, this contained 36 transistors on a chip 1 .6 mm x 1 .8 mm and was done with 9 masking levels and with 10 ?m minimal figure width.

Citation Download Citation

Hans Willy Becker "Early mask making during the 1960s in Dresden", Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); https://doi.org/10.1117/12.515064

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Reticles

Mask making

Photography

Integrated circuits

Microscopes

Semiconducting wafers

Show All Keywords

Keywords/Phrases

Search In:

Publication Years