At-wavelength metrology on Sc-based multilayers for the UV and water window

Franz Schaefers; Sergiy A. Yulin; Torsten Feigl; Norbert Kaiser

doi:10.1117/12.505695

4 November 2003 At-wavelength metrology on Sc-based multilayers for the UV and water window

Franz Schaefers, Sergiy A. Yulin, Torsten Feigl, Norbert Kaiser

Proceedings Volume 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies; (2003) https://doi.org/10.1117/12.505695
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Due to the unusual behavior of its optical constants the first transition element Sc with atomic configuration (3p⁶4s²3d) is a very attractive candidate for multilayer coatings optimized for the anomalous dispersion region of the 3p-3d transition around 28 eV (45 nm) and for the vicinity of the 2p absorption edge at 398 eV (3.12 nm), respectively. New normal incidence reflectivity data for Sc/Si at Sc 3p are shown with peak values up to 54% and for Cr/Sc at Sc 2p with peak values up to 17% are presented. The influence of optical performance on multilayer growth conditions and parameters are discussed in detail and the necessity of at-wavelength metrology for the final characterization is demonstrated. The results encourage e.g. applications for normal incidence optics used for high-power pulsed UV and x-ray laser systems and for x-ray microscopes operated in the water window.

Citation Download Citation

Franz Schaefers, Sergiy A. Yulin, Torsten Feigl, and Norbert Kaiser "At-wavelength metrology on Sc-based multilayers for the UV and water window", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); https://doi.org/10.1117/12.505695

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