Scanning probe lithography of self-assembled monolayers

Guohua Yang; Nabil A. Amro; Gang-yu Liu

doi:10.1117/12.504613

15 October 2003 Scanning probe lithography of self-assembled monolayers

Guohua Yang, Nabil A. Amro, Gang-yu Liu

Proceedings Volume 5220, Nanofabrication Technologies; (2003) https://doi.org/10.1117/12.504613
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Systematic studies on scanning probe lithography (SPL) methodologies have been performed using self-assembled monolayers (SAMs) on Au as examples. The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. Approaches include three atomic force microscopy (AFM) based methods, nanoshaving, nanografting, and nanopen reader and writer (NPRW), which rely on the local force, and two scanning tunneling microscopy (STM) based techniques, field-induced desorption and electron-induced desorption, which use electric field and tunneling electrons, respectively, for nanofabrication. The principle of these procedures, the critical steps in controlling local tip-surface interactions, and nanofabrication media will be discussed. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns.

Citation Download Citation

Guohua Yang, Nabil A. Amro, and Gang-yu Liu "Scanning probe lithography of self-assembled monolayers", Proc. SPIE 5220, Nanofabrication Technologies, (15 October 2003); https://doi.org/10.1117/12.504613

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