Compact high resolution four wave lateral shearing interferometer

Jean-Christophe F Chanteloup; Mathieu Cohen

doi:10.1117/12.513739

26 February 2004 Compact high resolution four wave lateral shearing interferometer

Jean-Christophe F Chanteloup, Mathieu Cohen

Proceedings Volume 5252, Optical Fabrication, Testing, and Metrology; (2004) https://doi.org/10.1117/12.513739
Event: Optical Systems Design, 2003, St. Etienne, France

Abstract

A simple, ultra-compact, four wave achromatic interferometric technique is used to measure with high accuracy and high transverse resolution wavefront of polychromatic lightsource. The wave front to be measured is replicated by a diffraction grating into four copies interfering together leading to an interference pattern very similar to the intensity distribution obtained in the focal plane of a Shack-Hartmann microlens array. The grating is made of optical glass modulated in depth on top of which a chromium mask is printed. The amplitude mask acts like a Hartmann plate. Used in association with the phase mask, it allows suppression of the unwanted zero and second orders. A CCD detector located in the vicinity of the grating records the interference pattern. This new wavefront sensor is able to resolve wavefront spatial frequencies 3 to 4 times higher than a conventional Shack-Hartmann technique using an equivalent CCD detector. Its dynamic is also much higher.

Citation Download Citation

Jean-Christophe F Chanteloup and Mathieu Cohen "Compact high resolution four wave lateral shearing interferometer", Proc. SPIE 5252, Optical Fabrication, Testing, and Metrology, (26 February 2004); https://doi.org/10.1117/12.513739

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