Paper
20 May 2004 Nanostructuring of polymers by hot embossing lithography
Hella-Christin Scheer, Thomas Glinsner, Matthias Wissen, Rainer Pelzer
Author Affiliations +
Abstract
While researchers of ever more advanced NGL systems are still struggling to demonstrate the feasibility to manufacture features well below 100 nm at an affordable cost and a reasonable throughput, nanoimprint technologies are emerging as a possible answer to these challenges. 100 nm patterns are imprinted with a fully patterned 4 inch diameter stamp in a low-temperature embossing process. In low temperature imprinting processes with polymers having very low glass transition temperatures heating and cooling cycles are minimized. This enables to increase the throughput of a hot embossing process, which is important for potential industrial applications.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hella-Christin Scheer, Thomas Glinsner, Matthias Wissen, and Rainer Pelzer "Nanostructuring of polymers by hot embossing lithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.535741
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Polymers

Lithography

Nanoimprint lithography

Glasses

Nanostructuring

Scanning electron microscopy

Manufacturing

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