Status of Philips' extreme UV source

Joseph Pankert; Klaus Bergmann; Juergen Klein; Willi Neff; Oliver Rosier; Stefan Seiwert; Christopher Smith; Sven Probst; Dominik Vaudrevange; Guido Siemons; Rolf Apetz; Jeroen Jonkers; Michael Loeken; Guenther Derra; Thomas Kruecken; Peter Zink

doi:10.1117/12.538041

20 May 2004 Status of Philips' extreme UV source

Joseph Pankert, Klaus Bergmann, Juergen Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Sven Probst, Dominik Vaudrevange, Guido Siemons, Rolf Apetz, Jeroen Jonkers, Michael Loeken, Guenther Derra, Thomas Kruecken, Peter Zink

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Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.538041
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

The paper describes progress of the Philips’ hollow cathode triggered (HCT) gas discharge EUV source. The program has been focussed on three major areas: (1) Studying the basic physics of ignition, pinch formation and EUV generation. The paper reports on progress in this area and particularly describes the underlying atomic physics both for Xe and Sn. (2) Discharge based on Sn. Results on overall efficiency more than 5 times the Xe efficiency are reported as well as high frequency operation up to 6.5 kHz. This system shows all the necessary ingredients for scaling to production power levels. (3) Integration of the Xe source in an alpha tool. Results on integration issues like electrode life time, collector life time and dose control will be presented.

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Joseph Pankert, Klaus Bergmann, Juergen Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Sven Probst, Dominik Vaudrevange, Guido Siemons, Rolf Apetz, Jeroen Jonkers, Michael Loeken, Guenther Derra, Thomas Kruecken, and Peter Zink "Status of Philips' extreme UV source", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.538041

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