200-mW continuous-wave laser source at 198.5 nm for lithographic applications

Andrea Caprara; Stuart Butterworth; Yefim Kil; Tracy Thonn; Keith Hubbard; Alan Macleod; Edward Rea; Colin Seaton; Luis Spinelli

doi:10.1117/12.535669

28 May 2004 200-mW continuous-wave laser source at 198.5 nm for lithographic applications

Andrea Caprara, Stuart Butterworth, Yefim Kil, Tracy Thonn, Keith Hubbard, Alan Macleod, Edward Rea, Colin Seaton, Luis Spinelli

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.535669
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

We report on the development and testing of a laser system that delivers up to 200 mW of continuous-wave radiation at 198.54 nm in a near diffraction-limited beam, to be used as a source for photolithography mask writing and mask inspection. The source has been developed with the support of International SEMATECH. The laser output is obtained by intra-cavity sum frequency generation in a CLBO (Cesium Lithium Borate) non-linear crystal

Citation Download Citation

Andrea Caprara, Stuart Butterworth, Yefim Kil, Tracy Thonn, Keith Hubbard, Alan Macleod, Edward Rea, Colin Seaton, and Luis Spinelli "200-mW continuous-wave laser source at 198.5 nm for lithographic applications", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.535669

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