Understanding focus in projection lithography systems

Pary Baluswamy; Hiroyuki Yamamoto; Zornitza Krasteva; Linda Somerville

doi:10.1117/12.536028

28 May 2004 Understanding focus in projection lithography systems

Pary Baluswamy, Hiroyuki Yamamoto, Zornitza Krasteva, Linda Somerville

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.536028
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Characterizing best focus for lithographic patterns is a very common task. It has been observed that the estimated best focus changes considerably with substrate type and substrates change quite frequently in process development. Such effects are seen even when the resist thickness is not altered. In this paper we will present data to identify the cause of the change and throw some light on the interaction between substrate and scanner leveling system.

Citation Download Citation

Pary Baluswamy, Hiroyuki Yamamoto, Zornitza Krasteva, and Linda Somerville "Understanding focus in projection lithography systems", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.536028

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