Modeling The Optical Microscope Images Of Thick Layers For The Purpose Of Linewidth Measurement

Chris P. Kirk; Diana Nyyssonen

doi:10.1117/12.947764

23 July 1985 Modeling The Optical Microscope Images Of Thick Layers For The Purpose Of Linewidth Measurement

Chris P. Kirk, Diana Nyyssonen

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947764
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A monochromatic, waveguide model is presented which can predict the optical microscope images of thick-layer objects including multilayer structures with sloping, curved, and undercut edges, granular structures such as polysilicon, and asymmetric objects. The model is used to illustrate the effects of line structure on the optical image. Qualitative agreement with experimentally obtained optical image profiles is demonstrated. Application of the model to study the effects of variations in layer thickness and edge geometry on linewidth measurements made at different stages of manufacturing an MOS device is discussed.

Citation Download Citation

Chris P. Kirk and Diana Nyyssonen "Modeling The Optical Microscope Images Of Thick Layers For The Purpose Of Linewidth Measurement", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947764

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