Design and manufacture of a large-aperture wavefront sensor

Richard A. Hutchin; Oberdan W. Otto; Alan Wertheimer

doi:10.1117/12.558375

12 October 2004 Design and manufacture of a large-aperture wavefront sensor

Richard A. Hutchin, Oberdan W. Otto, Alan Wertheimer

Proceedings Volume 5553, Advanced Wavefront Control: Methods, Devices, and Applications II; (2004) https://doi.org/10.1117/12.558375
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

A compact, low-cost wavefront sensor has been demonstrated to measure dynamic disturbances in 1-3 m diameter optical systems. With 448 subapertures and 4 KHz frame rate, it can measure disturbances up to 2 KHz at a level of 1/3800 waves rms at 0.65 μm. It also has a linear dynamic range of 3 X 10⁶:1 for ease of alignment. The principles of operation and test data are presented for the subaperture sensors (called NanoTrackers), which are lateral shearing interferometers capable of measuring tilt to 1.7 nanoradians rms at 8 µW of input power as well as phasing for segmented optical systems to 75 picometers rms (at 4 KHz).

Citation Download Citation

Richard A. Hutchin, Oberdan W. Otto, and Alan Wertheimer "Design and manufacture of a large-aperture wavefront sensor", Proc. SPIE 5553, Advanced Wavefront Control: Methods, Devices, and Applications II, (12 October 2004); https://doi.org/10.1117/12.558375

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