Paper
19 January 2005 Nano-optical devices and integration based on nanopattern replications and nanolithography
Jian Jim Wang, Lei Chen, Stephen-W. Tai, Xuegong Deng, Paul F. Sciortino, Feng Liu, Jiandong Deng, Xiaoming Liu, Anguel Nikolov, Dino Sinatore
Author Affiliations +
Proceedings Volume 5592, Nanofabrication: Technologies, Devices, and Applications; (2005) https://doi.org/10.1117/12.570040
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States
Abstract
We developed a nano-manufacturing platform based on wafer level nano-replication with mold and nano-pattern transfer by nano-lithography. The nano-replication process, which based on imprinting a single-layer spin-coated UV curable resist, achieved excellent nano-patterning fidelity and on-wafer uniformity with high-throughput. Nano-optic devices, such as, quarter wave plates and polarizers, were manufactured with the nano-manufacturing platform. Excellent wafer level performance and yield were achieved. The developed technology is suitable for high-throughput and low cost manufacturing needs for commercializing nano-structure based optical devices and integrated optical devices.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jian Jim Wang, Lei Chen, Stephen-W. Tai, Xuegong Deng, Paul F. Sciortino, Feng Liu, Jiandong Deng, Xiaoming Liu, Anguel Nikolov, and Dino Sinatore "Nano-optical devices and integration based on nanopattern replications and nanolithography", Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications, (19 January 2005); https://doi.org/10.1117/12.570040
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Semiconducting wafers

Ultraviolet radiation

Nano optics

Wave plates

Scanning electron microscopy

Nanoimprint lithography

Nanotechnology

Back to Top