Water-resisting compound red-sensitive photopolymer: mechanism and optimization of components

Xiaojing Hu; Heling Zhang; Guangyong Zhang; Yan Sheng; Yunzhi Wang; Ruiqu Zhao

doi:10.1117/12.574577

7 February 2005 Water-resisting compound red-sensitive photopolymer: mechanism and optimization of components

Xiaojing Hu, Heling Zhang, Guangyong Zhang, Yan Sheng, Yunzhi Wang, Ruiqu Zhao

Proceedings Volume 5636, Holography, Diffractive Optics, and Applications II; (2005) https://doi.org/10.1117/12.574577
Event: Photonics Asia, 2004, Beijing, China

Abstract

Water-resisting red-sensitive photopolymer with simple reprocessing has high sensitivity, high diffraction efficiency (>80%) and large refractive index modulation. Sensitivity and resolution is increased by using compound spectral sensitization compound coinitiator and compound monomers. The polymerization of the monomer can be controlled, and so the holograms preserved in the natural environment for a long time do not disappear. The photopolymer holographic recording materials without hidden reaction have good physical and chemical stability. The result of research indicates that the holographic recording plates have better real-time character. The photochemical polymerization mechanism and the effects of the components on the photopolymerization rate are investigated, and other characteristics about this material are also analyzed. In addition, the photopolymer is harmless and pollution-free, and so the photopolymer has large practical value and prospects of wide applications.

Citation Download Citation

Xiaojing Hu, Heling Zhang, Guangyong Zhang, Yan Sheng, Yunzhi Wang, and Ruiqu Zhao "Water-resisting compound red-sensitive photopolymer: mechanism and optimization of components", Proc. SPIE 5636, Holography, Diffractive Optics, and Applications II, (7 February 2005); https://doi.org/10.1117/12.574577

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