Parametric Analysis Of The CD Control Obtained Using Advanced Wafer Steppers

Steven A. Lis

doi:10.1117/12.949744

2 January 1986 Parametric Analysis Of The CD Control Obtained Using Advanced Wafer Steppers

Steven A. Lis

Proceedings Volume 0565, Micron and Submicron Integrated Circuit Metrology; (1986) https://doi.org/10.1117/12.949744
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

A parametric formula is presented which enables the determination of the CD control characteristics of a stepper from measurements of linewidth as a function of focus and exposure. The parameters obtained may be examined in terms of how they affect critical dimension control locally, and over the entire exposure field. Fundamental to the analysis is the ability to obtain large quantities of linewidth data. This problem is solved through the use of electrical test patterns. Experimental results of how this analysis has been used to examine several GCA steppers with state of the art reduction lenses is presented. A discussion is presented of how these resolution parameters are related to the reticle linewidth, exposure system, and various factors related both to the design of the stepper and processing of the wafers. Finally, an attempt is made to describe the exact physical meaning of each of the parameters in terms of their potential sources in the optical system.

Citation Download Citation

Steven A. Lis "Parametric Analysis Of The CD Control Obtained Using Advanced Wafer Steppers", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949744

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