Precise Measurements In A Scanning Electron Microscope

Tyler North

doi:10.1117/12.949750

2 January 1986 Precise Measurements In A Scanning Electron Microscope

Tyler North

Proceedings Volume 0565, Micron and Submicron Integrated Circuit Metrology; (1986) https://doi.org/10.1117/12.949750
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

As the latest integrated circuit designs move toward submicron feature dimensions, optical microscopes commmonly used for critical dimension (CD) measurements no longer have sufficient resolution. 1,2 Just as the semiconductor industry has turned to electron beam lithography for mask making and direct writing to achieve submicron dimensions in VLSI and VHSIC devices, so too must it turn to electron beam instruments to measure these devices. A computer based system for digitally controlling a scanning electron microscope (SEM) is described and its ability to provide precise, accurate measurements evaluated.

Citation Download Citation

Tyler North "Precise Measurements In A Scanning Electron Microscope", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949750

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