F2-laser-induced damage on transparent fluoride crystals

Yoshizo Kawaguchi; Aiko Narazaki; Tadatake Sato; Ryozo Kurosaki; Hiroyuki Niino; Hiroki Sato; Tomohiko Satonaga; Tsuguo Fukuda

doi:10.1117/12.596411

8 October 2004 F₂-laser-induced damage on transparent fluoride crystals

Yoshizo Kawaguchi, Aiko Narazaki, Tadatake Sato, Ryozo Kurosaki, Hiroyuki Niino, Hiroki Sato, Tomohiko Satonaga, Tsuguo Fukuda

Author Affiliations +

Proceedings Volume 5662, Fifth International Symposium on Laser Precision Microfabrication; (2004) https://doi.org/10.1117/12.596411
Event: Fifth International Symposium on Laser Precision Microfabrication, 2004, Nara, Japan

Abstract

For the application of F₂ lasers to micro-/nano-fabrication including photolithography, one of the important research subjects is to eliminate the chromatic aberration, and combination of lenses made of two optical materials with different refractive indices is the effective way. However, only CaF₂ is widely applied to lenses for a vacuum ultraviolet (VUV) beam, and a "second material" to be paired with CaF₂ is strongly requested. Here, we examined two fluoride crystals which are transparent in the VUV region, BaF₂ and LiCaAlF₆ grown by the Czochralski technique, as candidates for VUV optics. We investigated the change of the VUV transmittance and the onset of optical damage of these fluoride crystals against F₂ laser irradiation. These crystals showed good optical tolerance against cumulative F₂ laser irradiation, and the damage threshold of LiCaAlF₆ was similar to that of VUV grade CaF₂ while that of BaF2 was about half of the other two fluoride crystals.

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Yoshizo Kawaguchi, Aiko Narazaki, Tadatake Sato, Ryozo Kurosaki, Hiroyuki Niino, Hiroki Sato, Tomohiko Satonaga, and Tsuguo Fukuda "F₂-laser-induced damage on transparent fluoride crystals", Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); https://doi.org/10.1117/12.596411

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