Removal of low concentrations of acid gases: issues and solutions

Andrew J. Dallas; Lefei Ding; Jeremy Exley; Jon Joriman; Brian Hoang; Jonathan Parsons; Kevin Seguin; Dustin Zastera

doi:10.1117/12.599815

10 May 2005 Removal of low concentrations of acid gases: issues and solutions

Andrew J. Dallas, Lefei Ding, Jeremy Exley, Jon Joriman, Brian Hoang, Jonathan Parsons, Kevin Seguin, Dustin Zastera

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.599815
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Part per billion concentrations of acid gases such as SO_x and NO_x have been detected in both high purity gases and CDA lines. These contaminants can have deleterious effects on a number of high purity applications such as the optics found in lithography equipment steppers, scanners, and inspection tools. In addition, acidic gases have also been shown to reduce the life of masks and reticles, decrease fuel cell output due to catalyst poisoning, and cause hard disk drive crashes due to surface contamination and corrosion. Consequently, acid gas control in these applications has become a critical part of the required filtration system. SO_x concentrations are typically used as the baseline for acid gas filter exposure guidelines and performance testing. However, this approach has been shown to provide poor filter life predictions, which has been attributed to the presence of other acidic and organic contaminants that compete with SO_x for the available adsorption sites. Equally important, the type of sorbents and methods used to control acid gases can significantly affect the ability to remove SO_x. In this work we will compare the performance of various sorbents, structures, and methods for the removal of SO_x and NO_x.

Citation Download Citation

Andrew J. Dallas, Lefei Ding, Jeremy Exley, Jon Joriman, Brian Hoang, Jonathan Parsons, Kevin Seguin, and Dustin Zastera "Removal of low concentrations of acid gases: issues and solutions", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.599815

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