Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography

Tsukasa Hori; Takayuki Yabu; Takanobu Ishihara; Takayuki Watanabe; Osamu Wakabayashi; Akira Sumitani; Kouji Kakizaki; Hakaru Mizoguchi

doi:10.1117/12.601438

12 May 2005 Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography

Tsukasa Hori, Takayuki Yabu, Takanobu Ishihara, Takayuki Watanabe, Osamu Wakabayashi, Akira Sumitani, Kouji Kakizaki, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.601438
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

A feasibility study of next generation 6 kHz ArF laser for lithography is presented. High repetition rate operation of excimer lasers faces two technical challenges: 1) the occurrence of acoustic waves caused by the discharge in the laser chamber and 2) the huge energy consumption of the large gas flow fans. This paper describes our approach to dampen the acoustic waves. A computer simulation of acoustic wave generation inside the discharge chamber was done. The simulation correlates well with Schlieren photography measurements that visualized the acoustic waves. Based on these results, a chamber for 6 kHz repetition rate was newly designed. Measured spectral data (FHWM and E95) proved that the acoustic wave perturbation was remarkably reduced. A very efficient design method for high repetition rate laser chamber has therefore been established.

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Tsukasa Hori, Takayuki Yabu, Takanobu Ishihara, Takayuki Watanabe, Osamu Wakabayashi, Akira Sumitani, Kouji Kakizaki, and Hakaru Mizoguchi "Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.601438

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