Kinetics of laser induced changes of characteristic optical properties in Lithosil with 193nm excimer laser exposure

Ute Natura; Rolf Martin; Gordon von der Goenna; Michael Kahlke; Gabriele Fasold

doi:10.1117/12.599319

12 May 2005 Kinetics of laser induced changes of characteristic optical properties in Lithosil with 193nm excimer laser exposure

Ute Natura, Rolf Martin, Gordon von der Goenna, Michael Kahlke, Gabriele Fasold

Author Affiliations +

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.599319
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Fused silica is used as lens material in DUV microlithography systems. The kinetics of slow radiation induced defect generation in Lithosil^® including absorption, hydrogen consumption and changes of the refractive index is described in detail and in very good agreement with measured data in previous papers. In addition to these effects after long time irradiation fused silica is characterized by rapid damage processes (RDP) after short time irradiation. A model describing the absorption of RDP in dependence on energy density, repetition rate and time is described in this paper, the sensitivity of RDP on pre-irradiation and illumination conditions is discussed. Furthermore a method to reduce energy dependent absorption of RDP is mentioned.

Citation Download Citation

Ute Natura, Rolf Martin, Gordon von der Goenna, Michael Kahlke, and Gabriele Fasold "Kinetics of laser induced changes of characteristic optical properties in Lithosil with 193nm excimer laser exposure", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.599319

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