The influence of rapid recurrent thermal annealing on magnetic properties of CoFe-O thin film

Yu Shi; Huaiwu Zhang; Yulan Jing; Huaizhong Xing; Xiangdong Jiang

doi:10.1117/12.607332

8 December 2004 The influence of rapid recurrent thermal annealing on magnetic properties of CoFe-O thin film

Yu Shi, Huaiwu Zhang, Yulan Jing, Huaizhong Xing, Xiangdong Jiang

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607332
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

The variation of magnetic properties with a new rapid recurrent thermal annealing (RRTA) were studied in high moment thin film (Co _0.35Fe_0.65)99O1. After the rapid recurrent thermal annealing at 450°C for several periods of times, the coercivity as-deposited this thin film decreased from 105 to 3 Oe, and their resistivity was decreased to 70 percent. It is found that the method is more effective than other methods to improve the magnetic and electrical properties of (Co_0.35Fe_0.65)₉₉O₁ thin films.

Citation Download Citation

Yu Shi, Huaiwu Zhang, Yulan Jing, Huaizhong Xing, and Xiangdong Jiang "The influence of rapid recurrent thermal annealing on magnetic properties of CoFe-O thin film", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607332

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