Biaxial ellipsometry

Russell A. Chipman

doi:10.1117/12.623405

18 August 2005 Biaxial ellipsometry

Russell A. Chipman

Proceedings Volume 5875, Novel Optical Systems Design and Optimization VIII; 587506 (2005) https://doi.org/10.1117/12.623405
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Biaxial ellipsometry measures the optical constants of materials, anisotropic films, and stacks of anisotropic films. Materials of interest include birefringent crystals, polarizing materials and films, and the complex multilayer anisotropic structures used in liquid crystal displays. An approach using Mueller matrix imaging polarimetry to simultaneously measure and angularly resolve reflection and transmission over large solid angles is presented. Biaxial materials have three refractive indices and three absorption coefficients in orthogonal directions but with arbitrary orientation. Determination of the dielectric tensor provides a succinct and suitable material representation, and its accurate determination is the focus of this investigation.

Citation Download Citation

Russell A. Chipman "Biaxial ellipsometry", Proc. SPIE 5875, Novel Optical Systems Design and Optimization VIII, 587506 (18 August 2005); https://doi.org/10.1117/12.623405

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