The boron implantation in the graded-band MBE HgCdTe epilayer

Alexander V. Voitsekhovskii; Denis V. Grigor'ev; Andrey P. Kokhanenko; Alexander G. Korotaev; Yuriy G. Sidorov; Vasiliy S. Varavin; Sergey A. Dvoretsky; Nicolay N. Mikhailov; Niyaz Kh. Talipov

doi:10.1117/12.622158

29 September 2005 The boron implantation in the varied zone MBE MCT epilayer

Alexander V. Voitsekhovskii, Denis V. Grigor'ev, Andrey P. Kokhanenko, Alexander G. Korotaev, Yuriy G. Sidorov, Vasiliy S. Varavin, Sergey A. Dvoretsky, Nicolay N. Mikhailov, Niyaz Kh. Talipov

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Proceedings Volume 5957, Infrared Photoelectronics; 595718 (2005) https://doi.org/10.1117/12.622158
Event: Congress on Optics and Optoelectronics, 2005, Warsaw, Poland

Abstract

In the paper experimental results on boron implantation of the Cd_xHg_1-xTe epilayers with various composition near surface of the material are discussed. The electron concentration in the surface layer after irradiation vs irradiation dose and ion energy are investigated for range of doses 10¹¹ - 3•10¹⁵ cm^-2 and energies of 20 - 150 keV. Also the results of the electrical active defects distribution measurement, carried out by differential Hall method, after boron implantation are represented. Consideration of the received data shows, that composition gradient influence mainly on the various dynamics of accumulation of electric active radiation defects. The electric active defects distribution analysis shows, that the other factors are negligible.

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Alexander V. Voitsekhovskii, Denis V. Grigor'ev, Andrey P. Kokhanenko, Alexander G. Korotaev, Yuriy G. Sidorov, Vasiliy S. Varavin, Sergey A. Dvoretsky, Nicolay N. Mikhailov, and Niyaz Kh. Talipov "The boron implantation in the varied zone MBE MCT epilayer", Proc. SPIE 5957, Infrared Photoelectronics, 595718 (29 September 2005); https://doi.org/10.1117/12.622158

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KEYWORDS

Boron

Ions

Mercury

Cadmium

Ion implantation

Mercury cadmium telluride

Statistical analysis

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