Absorption and fluorescence measurements of DUV/VUV coatings

Ch. Mühlig; W. Triebel; H. Bernitzki; M. Klaus; J. Bergmann; S. Kufert; S. Bublitz

doi:10.1117/12.625079

4 October 2005 Absorption and fluorescence measurements of DUV/VUV coatings

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. Kufert, S. Bublitz

Proceedings Volume 5963, Advances in Optical Thin Films II; 59630P (2005) https://doi.org/10.1117/12.625079
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

The performance of optical coatings for high power DUV/VUV laser applications depends amongst others on residual absorption in the thin film layers due to impurities or defects. Using pulsed F₂ laser induced fluorescence measurements (LIF), characteristic non-intrinsic emissions of praseodymium, cerium and hydrocarbons are identified for several high reflecting AlF₃/LaF₃ based mirrors on CaF₂ substrates. The separate investigations of single AlF₃ and LaF₃ layers on silicon wafers indicate that these emissions result from the LaF₃ material. The amount of the impurities, however, varies strongly between different LaF₃ material grades. The influence of different LaF₃ material grades on the absorption properties of high reflecting mirrors is measured for the first time upon ArF laser irradiation using the laser induced deflection technique (LID). Low absorption values of less than 1*10^-3 are obtained for all samples. The absorption, however, varies by more than a factor of 2 which is correlated to the appearance of the praseodymium and cerium emissions in the LIF spectra.

Citation Download Citation

Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. Kufert, and S. Bublitz "Absorption and fluorescence measurements of DUV/VUV coatings", Proc. SPIE 5963, Advances in Optical Thin Films II, 59630P (4 October 2005); https://doi.org/10.1117/12.625079

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