Characterization of DUV optical materials by direct absorption measurements and LIF

W. Triebel

doi:10.1117/12.639133

7 February 2006 Characterization of DUV optical materials by direct absorption measurements and LIF

W. Triebel

Proceedings Volume 5991, Laser-Induced Damage in Optical Materials: 2005; 59911P (2006) https://doi.org/10.1117/12.639133
Event: Boulder Damage Symposium XXXVII: Annual Symposium on Optical Materials for High Power Lasers, 2005, Boulder, CO, United States

Abstract

Calcium fluoride and fused silica are low absorbing key optical bulk materials for pulsed DUV laser application. Due to their large band gap fluoride thin films play a key role for applications in the DUV spectral region. For their main use in laser microlithography, these materials are commonly characterized by in situ transmission measurements. A differentiation is not possible between absorption and scattering. Therefore, experimental techniques are highly attractive which selectively characterize the absorption process using small samples. A direct absorption measurement method using laser induced deflection of a probe beam (LID) was introduced and applied to bulk and thin film materials. Laser induced fluorescence (LIF) in bulk materials and coatings is investigated to correlate the absorption with microscopic properties like intrinsic and extrinsic defects.

Citation Download Citation

W. Triebel "Characterization of DUV optical materials by direct absorption measurements and LIF", Proc. SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 59911P (7 February 2006); https://doi.org/10.1117/12.639133

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