Fabrication of relief gratings on high photosensitive SiO<sub>2</sub>/ZrO<sub>2</sub> gel film by UV exposure

Xiang Xu; Bin Zhou; Chunze Liu; Chao Xu; Guangming Wu; Xingyuan Ni; Jun Shen

doi:10.1117/12.674210

9 June 2006 Fabrication of relief gratings on high photosensitive SiO₂/ZrO₂ gel film by UV exposure

Xiang Xu, Bin Zhou, Chunze Liu, Chao Xu, Guangming Wu, Xingyuan Ni, Jun Shen

Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61490N (2006) https://doi.org/10.1117/12.674210
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China

Abstract

SiO₂/ZrO₂ gel films were derived from Zr-butoxide modified chemically with β-diketones and then mixed with Tetraethyl orthosilicate via Sol-Gel process. The obtained gel films showed an absorption band, in characteristic of the π-&pi* transition of chelate ring at around 334 nm, and its refractive index was changed from 1.463~1.647. The Si-O-Zr, Zr-O bands were detected by FTIR. The result indicated that SiO₂ and ZrO₂ integrated uniformly in the films on micro molecule magnitude. The negative tone gel films were irradiated with high pressure mercury lamp through mask and then leached in ethyl alcohol. The above process gave uniform surface-relief gratings of periods at 2.0μm. The present study had proved that the photosensitive gel films were versatile for the fabrication of micro optical devices

Citation Download Citation

Xiang Xu, Bin Zhou, Chunze Liu, Chao Xu, Guangming Wu, Xingyuan Ni, and Jun Shen "Fabrication of relief gratings on high photosensitive SiO₂/ZrO₂ gel film by UV exposure", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61490N (9 June 2006); https://doi.org/10.1117/12.674210

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