Electron beam based modification of lithographic materials and the impact on critical dimensional metrology

H. Marchman; G. F. Lorusso; D. Soltz; L. Grella; Z. Luo; J. D. Byers; J. Varner; S. Vedula; R. Kuppa; A. R. Azordegan; G. Storms; L. H. Leunissen

doi:10.1117/12.656599

24 March 2006 Electron beam based modification of lithographic materials and the impact on critical dimensional metrology

H. Marchman, G. F. Lorusso, D. Soltz, L. Grella, Z. Luo, J. D. Byers, J. Varner, S. Vedula, R. Kuppa, A. R. Azordegan, G. Storms, L. H. Leunissen

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 615227 (2006) https://doi.org/10.1117/12.656599
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

CD-SEM is currently poised as the primary method of choice for CD metrology because of its nanometer scale spatial resolution, superior precision, and relatively high throughput. However, issues still continue to emerge that can threaten the measurement performance for the various sample types encountered. The impact of issues arising from electron beam induced modification of the sample materials on critical dimensional metrology and lithographic process control will be assessed and approaches to mitigate these effects will be proposed. The two primary issues of interest related to scanned electron beam based measurements of patterned lithographic materials in this article are shrinkage of the ArF 193nm resist and undesired deposition of contaminants occurring during CDSEM measurements.

Citation Download Citation

H. Marchman, G. F. Lorusso, D. Soltz, L. Grella, Z. Luo, J. D. Byers, J. Varner, S. Vedula, R. Kuppa, A. R. Azordegan, G. Storms, and L. H. Leunissen "Electron beam based modification of lithographic materials and the impact on critical dimensional metrology", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615227 (24 March 2006); https://doi.org/10.1117/12.656599

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available