Spectroscopic polarized scatterometry applied to single-line profiling

Jean-Louis Stehlé; Jean-Philippe Piel; Jose Campillo; Dorian Zahorski; Hugues Giovannini

doi:10.1117/12.657431

24 March 2006 Spectroscopic polarized scatterometry applied to single-line profiling

Jean-Louis Stehlé, Jean-Philippe Piel, Jose Campillo, Dorian Zahorski, Hugues Giovannini

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61522Z (2006) https://doi.org/10.1117/12.657431
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Scatterometry is one of the few metrology candidates that has true potential to analyse submicrometer critical dimension (CD). This physical constraint restricts initially the scalar theory of diffraction (Kirchhoff, Fraunhofer), where no computation is needed, to describe pattern with such characteristics. Now many techniques based in a rigourous analysis of diffraction (were polarisation is considered) are developped (RCWA), however these vector theory would be difficult to apply in real time due to time consuming by computation. For that reason, we push here scattering measurement of isolated lines, in the limit of the scalar theory. We use the scattering mode of SOPRA's GESP 5 instrument, which measure separately TE and TM polarisations.

Citation Download Citation

Jean-Louis Stehlé, Jean-Philippe Piel, Jose Campillo, Dorian Zahorski, and Hugues Giovannini "Spectroscopic polarized scatterometry applied to single-line profiling", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61522Z (24 March 2006); https://doi.org/10.1117/12.657431

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