Mask etcher data strategy for 45 nm and beyond

Richard Lewington; Ibrahim M. Ibrahim; Sheeba Panayil; Ajay Kumar; John Yamartino

doi:10.1117/12.681760

20 May 2006 Mask etcher data strategy for 45 nm and beyond

Richard Lewington, Ibrahim M. Ibrahim, Sheeba Panayil, Ajay Kumar, John Yamartino

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62831W (2006) https://doi.org/10.1117/12.681760
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Mask Etching for the 45nm technology node and beyond requires a system-level data and diagnostics strategy. This necessity stems from the need to control the performance of the mask etcher to increasingly stringent and diverse requirements of the mask production environment. Increasing mask costs and the capability to acquire and consolidate a wealth of data within the mask etch platform are primary motivators towards harnessing data mines for feedback into the mask etching optimization. There are offline and real-time possibilities and scenarios. Here, we discuss the data architecture, acquisition, and strategies of the Applied Materials Tetra II^TM Mask Etch System.

Citation Download Citation

Richard Lewington, Ibrahim M. Ibrahim, Sheeba Panayil, Ajay Kumar, and John Yamartino "Mask etcher data strategy for 45 nm and beyond", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831W (20 May 2006); https://doi.org/10.1117/12.681760

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available