Qualitative analysis of haze defects

Jaehyuck Choi; Soowan Koh; Sunghun Ji; Byung-Cheol Cha; Seong-Woon Choi; Woo-Sung Han

doi:10.1117/12.685733

20 October 2006 Qualitative analysis of haze defects

Jaehyuck Choi, Soowan Koh, Sunghun Ji, Byung-Cheol Cha, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6349, Photomask Technology 2006; 63492S (2006) https://doi.org/10.1117/12.685733
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

We created haze defects on the PSM mask surface using ArF haze accelerator while the mask was previously cleaned by SPM and SC1 solutions. Then we directly analyzed the defects on the surface using TOF-SMS. The comprehensive analysis of TOF-SIMS signifies that the defects mainly consist of hydrocarbons, Na, K, Cl, F, Mg, Al, etc., which have probably come from previous procedures, fab environments, storage materials, handling steps, or pellicle materials. This fact implies the exclusion of sulfate or ammonium ions from the mask surface should not be enough for the realization of haze-free PSM masks. In addition, complete removal of residual hydrocarbons deposited through previous procedures and perfect protection against environmental contaminants from fab air, storage materials, handling steps, or pellicle materials should be further accomplished.

Citation Download Citation

Jaehyuck Choi, Soowan Koh, Sunghun Ji, Byung-Cheol Cha, Seong-Woon Choi, and Woo-Sung Han "Qualitative analysis of haze defects", Proc. SPIE 6349, Photomask Technology 2006, 63492S (20 October 2006); https://doi.org/10.1117/12.685733

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