Study of the thermal characteristic of x-ray mask during short-pulsed exposure

Hongyan Shang; Yongkun Wang

doi:10.1117/12.717246

6 November 2006 Study of the thermal characteristic of x-ray mask during short-pulsed exposure

Hongyan Shang, Yongkun Wang

Proceedings Volume 6357, Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo-Electronic Technology, and Artificial Intelligence; 63573M (2006) https://doi.org/10.1117/12.717246
Event: Sixth International Symposium on Instrumentation and Control Technology, 2006, Beijing, China

Abstract

Three-dimensional finite element short-pulsed models of X-ray mask have been developed and the energy absorption function along the mask thickness direction has been considered. The results show that the absorber's temperature is higher than the substrate's because the absorber has higher absorption coefficient. In addition, the lower the absorber coverage of the mask, the lower the mask temperature is. The transient simulation results show that the mask temperature reached the maximum at the end of the short-pulsed exposure. It occurs at the interface between the substrate and the absorber, and the maximum is 52.7°C.

Citation Download Citation

Hongyan Shang and Yongkun Wang "Study of the thermal characteristic of x-ray mask during short-pulsed exposure", Proc. SPIE 6357, Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo-Electronic Technology, and Artificial Intelligence, 63573M (6 November 2006); https://doi.org/10.1117/12.717246

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