High quality UV AlGaN/AlGaN distributed Bragg reflectors and microcavities

Oleg Mitrofanov; S. Schmult; M. J. Manfra; T. Siegrist; N. G. Weimann; A. M. Sergent; R. J. Molnar

doi:10.1117/12.707924

8 February 2007 High quality UV AlGaN/AlGaN distributed Bragg reflectors and microcavities

Oleg Mitrofanov, S. Schmult, M. J. Manfra, T. Siegrist, N. G. Weimann, A. M. Sergent, R. J. Molnar

Proceedings Volume 6473, Gallium Nitride Materials and Devices II; 64731G (2007) https://doi.org/10.1117/12.707924
Event: Integrated Optoelectronic Devices 2007, 2007, San Jose, California, United States

Abstract

We demonstrate high-reflectivity crack-free Al_0.18Ga_0.82N/Al_0.8Ga_0.2N distributed Bragg reflectors (DBR) and monolithic microcavities grown by molecular beam epitaxy on thick c-axis GaN templates. The elastic strain energy in the epilayer is minimized by compensating the compressive and tensile stress in every period of the DBR structure. A 25 period DBR mirror provides a 26nm-wide stop band centered at 347 nm with the maximum reflectivity higher than 99%. The high-reflectivity DBRs can be used to form high Q-factor monolithic AlGaN/AlGaN microcavities.

Citation Download Citation

Oleg Mitrofanov, S. Schmult, M. J. Manfra, T. Siegrist, N. G. Weimann, A. M. Sergent, and R. J. Molnar "High quality UV AlGaN/AlGaN distributed Bragg reflectors and microcavities", Proc. SPIE 6473, Gallium Nitride Materials and Devices II, 64731G (8 February 2007); https://doi.org/10.1117/12.707924

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