Resolution enhancement technique using oxidation process with nitride hardmask process

Eunsoo Jeong; Jaehee Kim; Keeho Kim; Daeyoung Kim; Hyunju Lim

doi:10.1117/12.712017

5 April 2007 Resolution enhancement technique using oxidation process with nitride hardmask process

Eunsoo Jeong, Jaehee Kim, Keeho Kim, Daeyoung Kim, Hyunju Lim

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65183V (2007) https://doi.org/10.1117/12.712017
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

In lithography process, resolution enhancement technique (RET) which makes us use same lithographic equipments and materials is one of most important area to enhance development speed of device. The studies for RET have widely been done and the examples of RET are modified illumination, phase shifted mask and double exposure. The most studies have been done in lithography area. We think that area of RET study is not only lithography but also overall patterning including etching process. In this paper, we develop new RET and simultaneous patterning of Shallow Trench Isolation(STI) with gate pattern which is using oxidation process of silicone. When we use nitride hard mask process and etching with this oxidation process, we observed to achieve small resolution. Also we investigate process capability of this new process in terms of CD control, STI height and so on.

Citation Download Citation

Eunsoo Jeong, Jaehee Kim, Keeho Kim, Daeyoung Kim, and Hyunju Lim "Resolution enhancement technique using oxidation process with nitride hardmask process", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183V (5 April 2007); https://doi.org/10.1117/12.712017

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