Novel low-reflective index fluoropolymers-based top anti-reflective coatings (TARC) for 193-nm lithography

Tsuneo Yamashita; Takashi Hayami; Takuji Ishikawa; Takashi Kanemura; Hirokazu Aoyama

doi:10.1117/12.712414

30 March 2007 Novel low-reflective index fluoropolymers-based top anti-reflective coatings (TARC) for 193-nm lithography

Tsuneo Yamashita, Takashi Hayami, Takuji Ishikawa, Takashi Kanemura, Hirokazu Aoyama

Author Affiliations +

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65192U (2007) https://doi.org/10.1117/12.712414
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Implant lithography, which has up to now utilized 365-nm (i-line) and 248-nm (KrF) light sources, must now turn to 193-nm (ArF) sources. In implant lithography, an anti-reflective material is often used to coat the resist-film. The top anti-reflective coating (abbreviated to TARC) is most often used to reduce CD swing. TARC materials must have low refractive index and water solubility. The TARC materials for used 193-nm use must have very low reflective index and alternatives to perfluorooctylsulfonic acid (PFOS) and perfluorooctanoic acid (PFOA) must be found. We synthesized some novel fluorinated amorphous polymers as 193-nm TARC candidates. Their fundamental properties were characterized, such as transparency and reflective index at 193-nm (wavelength) along with their solubility in water and a standard alkaline developer. High transparency, i.e., k value less than 0.01, and very low reflective index, i.e., lower than n=1.4 at 193-nm wavelength are confirmed. Their dissolution behaviors are studied using the Quartz Crystal Microbalance (QCM) method. In surprise finding, we find that several of the polymers examined, those that have high fluorine content, dissolved in water. Test results show that the proposed polymers can be applied as top anti reflective coatings .

Citation Download Citation

Tsuneo Yamashita, Takashi Hayami, Takuji Ishikawa, Takashi Kanemura, and Hirokazu Aoyama "Novel low-reflective index fluoropolymers-based top anti-reflective coatings (TARC) for 193-nm lithography", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65192U (30 March 2007); https://doi.org/10.1117/12.712414

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