Quantitative measurement of EUV resist outgassing

Greg Denbeaux; Rashi Garg; Justin Waterman; Chimaobi Mbanaso; Jeroen Netten; Robert Brainard; Yu-Jen Fan; Leonid Yankulin; Alin Antohe; Kevin DeMarco; Molly Jaffe; Matthew Waldron; Kim Dean

doi:10.1117/12.737192

3 May 2007 Quantitative measurement of EUV resist outgassing

Greg Denbeaux, Rashi Garg, Justin Waterman, Chimaobi Mbanaso, Jeroen Netten, Robert Brainard, Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Kevin DeMarco, Molly Jaffe, Matthew Waldron, Kim Dean

Author Affiliations +

Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 653318 (2007) https://doi.org/10.1117/12.737192
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France

Abstract

The Mo/Si multilayer mirrors used for extreme ultraviolet (EUV) lithography can become contaminated during exposure in the presence of some hydrocarbons [1-3]. Because this leads to a loss in the reflectivity of the optics and throughput of the exposure tools, it needs to be avoided. Since photoresists are known to outgas during exposure to EUV radiation in a vacuum environment, the careful choice of materials is important to preserving the EUV optics. Work therefore has been performed to measure the species and quantities of molecules that outgas from EUV resists when exposed to EUV radiation [4-7].

Citation Download Citation

Greg Denbeaux, Rashi Garg, Justin Waterman, Chimaobi Mbanaso, Jeroen Netten, Robert Brainard, Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Kevin DeMarco, Molly Jaffe, Matthew Waldron, and Kim Dean "Quantitative measurement of EUV resist outgassing", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 653318 (3 May 2007); https://doi.org/10.1117/12.737192

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