Paper
4 May 2007 Finesse of silicon-based terahertz Fabry-Perot spectrometer
Justin W. Cleary, Robert E. Peale, Ravi Todi, Kalpathy Sundaram, Oliver Edwards
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Abstract
This paper considers factors that affect achievable finesse for a recently demonstrated silicon-based scanning Fabry- Perot transmission filter at millimeter and sub-millimeter wavelengths. The mirrors are formed by alternating quarter-wave optical thicknesses of silicon and air in the usual Bragg configuration. Fundamental loss by lattice and free carrier absorption are considered. Technological factors such as surface roughness, bowing, and misalignment are considered for various proposed manufacturing schemes.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Justin W. Cleary, Robert E. Peale, Ravi Todi, Kalpathy Sundaram, and Oliver Edwards "Finesse of silicon-based terahertz Fabry-Perot spectrometer", Proc. SPIE 6549, Terahertz for Military and Security Applications V, 65490R (4 May 2007); https://doi.org/10.1117/12.719577
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Cited by 1 scholarly publication and 5 patents.
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KEYWORDS
Silicon

Mirrors

Semiconducting wafers

Fabry–Perot interferometers

Etching

Spectroscopy

Absorption

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