Method of matrix alignment for nanostructure lithography

Andre Sokolnikov

doi:10.1117/12.720131

3 May 2007 Method of matrix alignment for nanostructure lithography

Andre Sokolnikov

Proceedings Volume 6556, Micro (MEMS) and Nanotechnologies for Defense and Security; 65560V (2007) https://doi.org/10.1117/12.720131
Event: Defense and Security Symposium, 2007, Orlando, Florida, United States

Abstract

Nanoimprint is an emerging lithographic technology that promises high-throughput pattering of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffraction or beam scattering in other conventional techniques. The difficulty arises with the exact 90⁰ setting of the mould above the wafer. Proposed is the method of achieving this perpendicularity by the means of the crystallographic properties of Si or GaAs and the matrix made of the above-mentioned materials.

Citation Download Citation

Andre Sokolnikov "Method of matrix alignment for nanostructure lithography", Proc. SPIE 6556, Micro (MEMS) and Nanotechnologies for Defense and Security, 65560V (3 May 2007); https://doi.org/10.1117/12.720131

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