Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa; Hidekazu Mimura; Satoshi Matsuyama; Hirokatsu Yumoto; Takashi Kimura; Yasuhisa Sano; Kenji Tamasaku; Yoshinori Nishino; Makina Yabashi; Tetsuya Ishikawa; Kazuto Yamauchi

doi:10.1117/12.733749

1 October 2007 Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Author Affiliations +

Proceedings Volume 6704, Advances in Metrology for X-Ray and EUV Optics II; 670404 (2007) https://doi.org/10.1117/12.733749
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.

Citation Download Citation

Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Hard x-ray wavefront measurement and control for hard x-ray nanofocusing", Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 670404 (1 October 2007); https://doi.org/10.1117/12.733749

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