Deposition and analysis of small d-spacing depth graded multilayer structures

David M. Broadway; Yuriy Y. Platonov; Roberto Mancini; Riccardo Tommasini

doi:10.1117/12.735595

20 September 2007 Deposition and analysis of small d-spacing depth graded multilayer structures

David M. Broadway, Yuriy Y. Platonov, Roberto Mancini, Riccardo Tommasini

Proceedings Volume 6705, Advances in X-Ray/EUV Optics and Components II; 67050A (2007) https://doi.org/10.1117/12.735595
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

A method for the determination of the deposited layer thickness distribution through the stack has been presented in a previous article [1]. We illustrate the validity of this model by considering the deposition of a Mo/B₄C design. This method is further improved to allow for the additional determination of roughness/diffusion through the multilayer stack. We show results of the analysis for a deposited small d-spacing W/B₄C design (d_avg=1.5nm) which give compelling evidence for the existence and determination of a minimum value of thickness that can be allowed in the design of the structure. From this analysis the multilayer was redesigned with a constraint on the minimum thickness allowed in the stack. We show successful results of the deposited redesigned structure. Finally, we show the influence of random layer thickness error on the resultant reflectivity.

Citation Download Citation

David M. Broadway, Yuriy Y. Platonov, Roberto Mancini, and Riccardo Tommasini "Deposition and analysis of small d-spacing depth graded multilayer structures", Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 67050A (20 September 2007); https://doi.org/10.1117/12.735595

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