Paper
19 November 2007 Reactive ion beam etching of large-aperture multilayer diffraction gratings by radio frequency ion beam source
Ying Liu, Dequan Xu, Xiangdong Xu, Yilin Hong, Shaojun Fu D.V.M.
Author Affiliations +
Proceedings Volume 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 67240K (2007) https://doi.org/10.1117/12.782520
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
The major etching processes of a large-aperture multilayer diffraction grating, including the uniformity of the ion beam current along the major axis and the on-line measurement of the diffraction intensity distribution are described. A large-aperture ion beam etcher with radio frequency linear source has been developed to fabricate large-aperture diffractive optical elements. The length with ±5.1% uniformity of the ion beam current distribution along the major axis is 30 cm. A series of multilayer diffraction gratings were etched successfully by using this etcher with CHF3 chemistry. Multilayer diffraction gratings on a 80 mm×150 mm BK7 substrate etched for laser systems are shown. The grating exhibits an averaged diffraction efficiency about 96% at TE polarization of 1 064 nm light viewed at Littrow angle.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ying Liu, Dequan Xu, Xiangdong Xu, Yilin Hong, and Shaojun Fu D.V.M. "Reactive ion beam etching of large-aperture multilayer diffraction gratings by radio frequency ion beam source", Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67240K (19 November 2007); https://doi.org/10.1117/12.782520
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KEYWORDS
Diffraction gratings

Ion beams

Etching

Diffraction

Reactive ion etching

Diffractive optical elements

Hybrid fiber optics

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