Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M

Zhigang Wang; Kock Khuen Seet; Ritsuo Fukaya; Yasuhiro Kadowaki; Noriaki Arai; Makoto Ezumi; Hidetoshi Satoh

doi:10.1117/12.746332

1 November 2007 Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M

Zhigang Wang, Kock Khuen Seet, Ritsuo Fukaya, Yasuhiro Kadowaki, Noriaki Arai, Makoto Ezumi, Hidetoshi Satoh

Proceedings Volume 6730, Photomask Technology 2007; 67304T (2007) https://doi.org/10.1117/12.746332
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

To realize good repeatability in CD measurements, many issues have to be addressed including system stability, sample charging and contamination, measurement conditions, and image processing. The S-9380M is a mask CD-SEM (Critical Dimension Scanning Electron Microscope) system developed for measurement and inspection of 45 nm node photomask. The S-9380M has several innovations like a newly designed optical system to minimize sample charge-up and drift effects, ultra-high resolution (3nm) imaging to enable measurements at high magnification, and an integrated ultra-violet (UV) unit for pre-treatment of the mask to rid the surface of organic contaminants. This paper presents measurements carried out using the S-9380M system, and showed that superior performance is achieved with short-term dynamic repeatability of 3σ less than 0.6 nm (for line patterns), and long-term dynamic repeatability of 3σ less than 1.0 nm without trend modification.

Citation Download Citation

Zhigang Wang, Kock Khuen Seet, Ritsuo Fukaya, Yasuhiro Kadowaki, Noriaki Arai, Makoto Ezumi, and Hidetoshi Satoh "Long-term critical dimension measurement performance for a new mask CD-SEM, S-9380M", Proc. SPIE 6730, Photomask Technology 2007, 67304T (1 November 2007); https://doi.org/10.1117/12.746332

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