Printing of sub-resolution shots in electron beam direct write with variable shaped beam machines

Frank Thrum; Johannes Kretz; Christoph Hohle; Kang-Hoon Choi; Katja Keil

doi:10.1117/12.798585

2 May 2008 Printing of sub-resolution shots in electron beam direct write with variable shaped beam machines

Frank Thrum, Johannes Kretz, Christoph Hohle, Kang-Hoon Choi, Katja Keil

Proceedings Volume 6792, 24th European Mask and Lithography Conference; 67920B (2008) https://doi.org/10.1117/12.798585
Event: 24th European Mask and Lithography Conference, 2008, Dresden, Germany

Abstract

The resolution of a variable shaped beam writer is typically given for the standard geometries like isolated line, isolated space, and dense (1:1) line/space pattern. It is related to the imaging power of both the tool itself as well as the resist process. In this paper we concentrate on small shots with dimensions smaller than the resolution limit, butting to a larger shot. We show experimentally that for a line resolution of 40 nm the resolution for butting sub resolution shots can be as small as 20 nm.

Citation Download Citation

Frank Thrum, Johannes Kretz, Christoph Hohle, Kang-Hoon Choi, and Katja Keil "Printing of sub-resolution shots in electron beam direct write with variable shaped beam machines", Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920B (2 May 2008); https://doi.org/10.1117/12.798585

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