Paper
19 December 1986 Compressive Thin Films For Increased Fracture Toughness
P. H. Kobrin, A. B. Harker
Author Affiliations +
Abstract
Improved fracture toughness by as much as a factor of two in infrared window materials has been observed after the deposition of thin compressive surface films by reactive ion beam techniques. The relationship between film stress, film thickness, substrate properties, and observed fracture toughness are being investigated, using Vickers indentation to determine mechanical properties and a bending plate capacitance method to independently determine film stress. Comparisons are made to a theoretical model developed by Lawn and Fuller.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. H. Kobrin and A. B. Harker "Compressive Thin Films For Increased Fracture Toughness", Proc. SPIE 0683, Infrared and Optical Transmitting Materials, (19 December 1986); https://doi.org/10.1117/12.936429
Lens.org Logo
CITATIONS
Cited by 4 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Glasses

Silicon

Thin films

Infrared radiation

Crystals

Silicon films

Capacitance

RELATED CONTENT

Epitaxial liftoff technology
Proceedings of SPIE (December 01 1991)
Optical and surface properties of ZnO thin films by PLD
Proceedings of SPIE (February 25 2002)
Radiation-stable infrared optical components
Proceedings of SPIE (April 20 1998)
Preparation of Li2B4O7 thin films by sol gel method and...
Proceedings of SPIE (November 01 1990)

Back to Top