Polarimetry of illumination for 193-nm lithography used for the manufacture of high-end LSIs

Hiroshi Nomura; Yohko Furutono

doi:10.1117/12.753845

28 November 2007 Polarimetry of illumination for 193-nm lithography used for the manufacture of high-end LSIs

Hiroshi Nomura, Yohko Furutono

Proceedings Volume 6834, Optical Design and Testing III; 683408 (2007) https://doi.org/10.1117/12.753845
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

We have constructed a theory of polarimetry of illumination used in 193-nm lithography equipments, fabricated a polarimeter mask, and demonstrated it for a hyper-NA (numerical aperture) lithography scanner. The polarimeter mask comprises newly- developed polarizers and quarter-wave (λ/4) plates. The thin plate polarizers are made of calcite (CaCO₃), and the λ/4 plates are composed of two crystalline quartz (α-SiO₂) plates and two sapphire (Al₂O₃) plates. A light traveling through a window of the polarimeter mask reaches an image detector at the wafer level through projection optics. Whereas the polarization states of the projection optics are unknown to us, Stokes parameters of the illumination light are formulated without any influence from the projection optics.

Citation Download Citation

Hiroshi Nomura and Yohko Furutono "Polarimetry of illumination for 193-nm lithography used for the manufacture of high-end LSIs", Proc. SPIE 6834, Optical Design and Testing III, 683408 (28 November 2007); https://doi.org/10.1117/12.753845

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