EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki; M. Okada; K. Otaki; Y. Zhu; J. Kawakami; K. Murakami; C. Ouchi; M. Hasegawa; S. Kato; T. Hasegawa; H. Yokota; T. Honda; M. Niibe

doi:10.1117/12.772624

21 March 2008 EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, M. Niibe

Author Affiliations +

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69212U (2008) https://doi.org/10.1117/12.772624
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The wavefront measurements have been performed with the EUV Wavefront Metrology System (EWMS) for the first time using a prototype projection optic as a test optic. The wavefronts of the test optic was measured at the five positions in the exposure field with the Digital Talbot Interferometer (DTI). The RMS magnitude of the wavefront errors ranged from 0.71 λ (9.58 nm) to 1.67 λ (22.75 nm). The results obtained with the DTI were compared to those with the Cross Grating Lateral Shearing Interferometer (CGLSI). As a result of a repeatability assessment, it was found that the EWMS can stably measure the wavefronts of the test optic. Additionally, unwrapping of the phase map was found to be related to the precision of the measurement.

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K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, and M. Niibe "EUV wavefront measurement of six-mirror optics using EWMS", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212U (21 March 2008); https://doi.org/10.1117/12.772624

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