Particle-contamination analysis for reticles in carrier inner pods

John R. Torczynski; Michael A. Gallis; Daniel J. Rader

doi:10.1117/12.768409

21 March 2008 Particle-contamination analysis for reticles in carrier inner pods

John R. Torczynski, Michael A. Gallis, Daniel J. Rader

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69213G (2008) https://doi.org/10.1117/12.768409
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Particle contamination is analyzed for a reticle in the inner pod of a carrier with particular emphasis on the effect of raising the cover of the inner pod before removing the reticle from the carrier at atmospheric pressure (not low pressure). Two mechanisms for particle transport into the gap between the base plate and the reticle are considered: injection and advection-diffusion. It is shown that injection is not an important mechanism but that advection-diffusion transport can carry particles deeply into the gap, where they can deposit on the reticle surface. Closed-form expressions are presented for the transmission probability that particles at the reticle edge are transported inward past the exclusion zone around the reticle perimeter. The gas flow in the gap that occurs during cover-raising is found by numerical simulation, and the closed-form expressions are applied to determine the probability of contamination for different cover-raising scenarios.

Citation Download Citation

John R. Torczynski, Michael A. Gallis, and Daniel J. Rader "Particle-contamination analysis for reticles in carrier inner pods", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69213G (21 March 2008); https://doi.org/10.1117/12.768409

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