Paper
11 March 2008 Crystallization of manganese cobalt nickelate films prepared by chemical deposition
Yujian Ge, Zhiming Huang, Yun Hou, Tianxin Li, Junhao Chu
Author Affiliations +
Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69842G (2008) https://doi.org/10.1117/12.792120
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
Manganese cobalt nickelate films (MnxCoyNi3-x-y)O4 (MCN) are successfully prepared by chemical deposition method at a crystallization temperature of 600°C, which is greatly reduced from the traditional sintered temperature of ~1050 - 1200°C. From the XRD and AFM, we find the grain size of the MCN films increases from 20 to 60 nm with the annealing temperature increase from 600°C to 900°C.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yujian Ge, Zhiming Huang, Yun Hou, Tianxin Li, and Junhao Chu "Crystallization of manganese cobalt nickelate films prepared by chemical deposition", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842G (11 March 2008); https://doi.org/10.1117/12.792120
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KEYWORDS
Cobalt

Crystals

Manganese

Annealing

Silicon

Nickel

Atomic force microscopy

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