Production of extreme ultraviolet (EUV) quality silicon carbide (SiC) aspheric optics

Jay Schwartz; Andrea Arneson; Joseph Robichaud

doi:10.1117/12.789731

23 July 2008 Production of extreme ultraviolet (EUV) quality silicon carbide (SiC) aspheric optics

Jay Schwartz, Andrea Arneson, Joseph Robichaud

Proceedings Volume 7018, Advanced Optical and Mechanical Technologies in Telescopes and Instrumentation; 70180U (2008) https://doi.org/10.1117/12.789731
Event: SPIE Astronomical Telescopes + Instrumentation, 2008, Marseille, France

Abstract

L-3 Communications, SSG-Tinsley reports the optical performance demonstrated with an EUV quality aspheric mirror. The off axis ellipsoidal reflector demonstrates a surface figure of < 3 nm RMS and a surface finish which ranges from 3 - 7 Angstroms RMS depending on the spatial period of interest. Interferometric data is provided along with surface roughness results obtained with phase measuring microscopy. The capability to produce high quality SiC aspheric optics, combined with the inherent thermal stability associated with SiC, enables a number of advanced mission concepts, including next generation solar observing.

Citation Download Citation

Jay Schwartz, Andrea Arneson, and Joseph Robichaud "Production of extreme ultraviolet (EUV) quality silicon carbide (SiC) aspheric optics", Proc. SPIE 7018, Advanced Optical and Mechanical Technologies in Telescopes and Instrumentation, 70180U (23 July 2008); https://doi.org/10.1117/12.789731

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