Fast integrated die-to-die transmitted, reflected and STARlight-2 defect inspection on memory masks

Andy Lan; Jenny Hsu; Swapnajit Chakravarty; Vincent Hsu; Ellison Chen; Eric Lu; John Miller

doi:10.1117/12.793060

19 May 2008 Fast integrated die-to-die transmitted, reflected and STARlight-2 defect inspection on memory masks

Andy Lan, Jenny Hsu, Swapnajit Chakravarty, Vincent Hsu, Ellison Chen, Eric Lu, John Miller

Author Affiliations +

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70281J (2008) https://doi.org/10.1117/12.793060
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

Single mode inspections, using die-to-die Transmitted (ddT) or die-to-die Reflected (ddR) modes, provides a high level of sensitivity to opaque and clear defects on reticles. Die-to-die (DD) inspections however, cannot inspect the scribes or frames which are potential locations for haze growth. Historically, STARLight-2^TM (SL2) has been the only mode effectively utilized for contamination inspection in reticle scribes and frames. However, SL2 is designed for identifying contamination and not pattern defects on a mask. The solution presented here is Fast Integrated Inspection which includes ddT, ddR, and SL2, and allows the user to inspect a reticle for pattern and contamination defects over patterned areas and scribes simultaneously, and in unit time.

Citation Download Citation

Andy Lan, Jenny Hsu, Swapnajit Chakravarty, Vincent Hsu, Ellison Chen, Eric Lu, and John Miller "Fast integrated die-to-die transmitted, reflected and STARlight-2 defect inspection on memory masks", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70281J (19 May 2008); https://doi.org/10.1117/12.793060

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